On modelling thermal oxidation of Silicon II: numerical aspects (Q4493652): Difference between revisions
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On modelling thermal oxidation of Silicon II: numerical aspects | |||
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On modelling thermal oxidation of Silicon II: numerical aspects (English) | |||
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Latest revision as of 09:50, 30 July 2024
scientific article; zbMATH DE number 1487159
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | On modelling thermal oxidation of Silicon II: numerical aspects |
scientific article; zbMATH DE number 1487159 |
Statements
14 July 2002
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finite element method
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discontinuous interpolation
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oxidation of silicon
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silicon-silicon dioxide interface
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level-set method
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large expansion
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staggered scheme
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On modelling thermal oxidation of Silicon II: numerical aspects (English)
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