Self-similar solutions for diffusion in semiconductors (Q4307818): Difference between revisions
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| Property / cites work: Self-similar solutions for infiltration of dopant into semiconductors / rank | |||
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| Property / cites work: Q5848416 / rank | |||
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| Property / cites work: Mathematical analysis of a model for substitutional diffusion / rank | |||
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| Property / cites work: The existence of similar solutions for some laminar boundary layer problems / rank | |||
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| Property / full work available at URL: https://doi.org/10.1017/s0308210500028742 / rank | |||
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| Property / OpenAlex ID: W2101024196 / rank | |||
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Latest revision as of 10:03, 30 July 2024
scientific article; zbMATH DE number 646902
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | Self-similar solutions for diffusion in semiconductors |
scientific article; zbMATH DE number 646902 |
Statements
Self-similar solutions for diffusion in semiconductors (English)
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4 October 1994
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development of concentration profiles
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profiles of self-similar form
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asymptotic properties
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