Finite-length mask effects in the isolation oxidation of silicon (Q4344304): Difference between revisions
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Latest revision as of 00:09, 20 March 2024
scientific article; zbMATH DE number 1033941
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | Finite-length mask effects in the isolation oxidation of silicon |
scientific article; zbMATH DE number 1033941 |
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Finite-length mask effects in the isolation oxidation of silicon (English)
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15 July 1997
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microelectronics
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oxidation
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integrated circuit
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submicron silicon-isolation technologies
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