On modelling thermal oxidation of Silicon II: numerical aspects (Q4493652): Difference between revisions
From MaRDI portal
ReferenceBot (talk | contribs) Changed an Item |
Set OpenAlex properties. |
||
| label / en | label / en | ||
On modelling thermal oxidation of Silicon II: numerical aspects | |||
| Property / full work available at URL | |||
| Property / full work available at URL: https://doi.org/10.1002/(sici)1097-0207(20000110/30)47:1/3<359::aid-nme775>3.0.co;2-7 / rank | |||
Normal rank | |||
| Property / OpenAlex ID | |||
| Property / OpenAlex ID: W1998346759 / rank | |||
Normal rank | |||
| Property / title | |||
On modelling thermal oxidation of Silicon II: numerical aspects (English) | |||
| Property / title: On modelling thermal oxidation of Silicon II: numerical aspects (English) / rank | |||
Normal rank | |||
Latest revision as of 09:50, 30 July 2024
scientific article; zbMATH DE number 1487159
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | On modelling thermal oxidation of Silicon II: numerical aspects |
scientific article; zbMATH DE number 1487159 |
Statements
14 July 2002
0 references
finite element method
0 references
discontinuous interpolation
0 references
oxidation of silicon
0 references
silicon-silicon dioxide interface
0 references
level-set method
0 references
large expansion
0 references
staggered scheme
0 references
On modelling thermal oxidation of Silicon II: numerical aspects (English)
0 references
