Examining Performance Enhancement of p-Channel Strained-SiGe MOSFET Devices
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Publication:5756187
DOI10.1007/978-3-540-70942-8_22zbMath1137.82352OpenAlexW1533562472MaRDI QIDQ5756187
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Publication date: 3 September 2007
Published in: Numerical Methods and Applications (Search for Journal in Brave)
Full work available at URL: https://doi.org/10.1007/978-3-540-70942-8_22
strainsemiconductorsperformance enhancementquantum confinementbandstructure effectsp-channel MOSFETsp-channel SiGe devicesquantum mechanical space-quantization
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