Diffusional relaxation in random sequential deposition

DOI10.1088/0305-4470/30/9/003MaRDI QIDQ4232162zbMATH OpenOpenAlexWikidataFDO

Authors E. Eisenberg, Asher Baram

Publication date 18 May 1999

Published in Journal of Physics A: Mathematical and General (Search for Journal in Brave)

Full work available at URL https://arxiv.org/abs/cond-mat/9610181

zbMATH Keywords

diffusional relaxationrandom sequential deposition process

Mathematics Subject Classification ID

Random walks, random surfaces, lattice animals, etc. in equilibrium statistical mechanics (82B41)

Abstract: The effect of diffusional relaxation on the random sequential deposition process is studied in the limit of fast deposition. Expression for the coverage as a function of time are analytically derived for both the short-time and long-time regimes. These results are tested and compared with numerical simulations.

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