Finite-length mask effects in the isolation oxidation of silicon (Q4344304)
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scientific article; zbMATH DE number 1033941
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| default for all languages | No label defined |
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| English | Finite-length mask effects in the isolation oxidation of silicon |
scientific article; zbMATH DE number 1033941 |
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Finite-length mask effects in the isolation oxidation of silicon (English)
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15 July 1997
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microelectronics
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oxidation
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integrated circuit
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submicron silicon-isolation technologies
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0.8281566500663757
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0.8227893114089966
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0.8095808029174805
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0.7855530381202698
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