Adaptive control to a dry etch process by microcomputer
From MaRDI portal
Publication:1168929
DOI10.1016/0005-1098(82)90055-3zbMath0493.93031MaRDI QIDQ1168929
Publication date: 1982
Published in: Automatica (Search for Journal in Brave)
Full work available at URL: https://doi.org/10.1016/0005-1098(82)90055-3
microcomputers; deadbeat controller; solid-state physics; dry etch processes; real-time control system with adaptive control; recursive least-squares estimation
93C10: Nonlinear systems in control theory
93C40: Adaptive control/observation systems
93E10: Estimation and detection in stochastic control theory
68N25: Theory of operating systems
76X05: Ionized gas flow in electromagnetic fields; plasmic flow
68N99: Theory of software