A level set approach to a unified model for etching, deposition, and lithography. III: Redeposition, reemission, surface diffusion, and complex simulations

DOI10.1006/jcph.1997.5817zbMath0952.65113OpenAlexW2050946498MaRDI QIDQ1377900

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Publication date: 17 February 1998

Published in: (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1006/jcph.1997.5817

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