Optimization of a horizontal MOCVD reactor for uniform epitaxial layer growth
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Publication:1579279
DOI10.1016/S0017-9310(99)00251-3zbMath0973.76028MaRDI QIDQ1579279
Publication date: 5 December 2001
Published in: International Journal of Heat and Mass Transfer (Search for Journal in Brave)
Chebyshev polynomials; reduced basis method; numerical optimization; sequential linear programming; non-orthogonal grid; film uniformity; horizontal metal-organic chemical vapor deposition reactor; optimal reactor shape; SIMPLE-type finite volume method
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