A Monte Carlo model for predicting the effective emissivity of the silicon wafer in rapid thermal processing furnaces

DOI10.1016/S0017-9310(01)00295-2MaRDI QIDQ1598342zbMATH OpenOpenAlexFDO

Authors R. Smith

Publication date 5 August 2002

Published in International Journal of Heat and Mass Transfer (Search for Journal in Brave)

Full work available at URL https://doi.org/10.1016/s0017-9310(01)00295-2

zbMATH Keywords

Monte Carlo methodrapid thermal processingeffective emissivity model

Mathematics Subject Classification ID

Statistical mechanics of semiconductors (82D37)

Cited in

(1)

• Heat and mass transfer in two-layer elastic composite subjected to thermal infrared radiation

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