A model for monolayer deposition with interacting particles

DOI10.1016/S0960-0779(00)00042-4MaRDI QIDQ1862277zbMATH OpenFDO

Authors Yanyan Li

Publication date 19 March 2003

Published in Chaos, Solitons and Fractals (Search for Journal in Brave)

Full work available at URL https://doi.org/10.1016/S0960-0779(00)00042-4

Mathematics Subject Classification ID

Interacting particle systems in time-dependent statistical mechanics (82C22)

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Cites work

• scientific article; zbMATH DE number 3169908 (Why is no real title available?)
• scientific article; zbMATH DE number 1776593 (Why is no real title available?)
• scientific article; zbMATH DE number 195103 (Why is no real title available?)
• scientific article; zbMATH DE number 3084323 (Why is no real title available?)
• Sensitive dependence on initial conditions for cellular automata

Cited in

(6)

• Kinetics of monolayer growth
• Random deposition model of particles with discrete orientations
• A simple non-equilibrium, statistical-physics toy model of thin-film growth
• Monte Carlo Simulations of Solid 2D Phase Growth on 1D Solid Substrates with Square-Wave Surface Profiles. Influence of Hole Design and Depositing Particle Surface Diffusion
• Exact results for surface deposition with precursor layer diffusion
• ADVANCED MODELLING OF EPITAXIAL ORDERING OF ORGANIC LAYERS ON CRYSTALLINE SURFACES

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