Arbitrary-pressure chemical vapor deposition modeling using direct simulation Monte Carlo with nonlinear surface chemistry
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Publication:1879617
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Cites work
- A convergence proof for Bird's direct simulation Monte Carlo method for the Boltzmann equation
- Analysis of discretization in the direct simulation Monte Carlo
- DIRECT SIMULATION MONTE CARLO: Recent Advances and Applications
- Direct simulation of gas flows at the molecular level
- Fronts propagating with curvature-dependent speed: Algorithms based on Hamilton-Jacobi formulations
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- Time step truncation error in direct simulation Monte Carlo
Cited in
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- The direction decoupled quiet direct simulation method for rapid simulation of axisymmetric inviscid unsteady flow in pulsed pressure chemical vapour deposition
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- Fluid flow and transport processes in a large area atmospheric pressure stagnation flow CVD reactor for deposition of thin films
- A Multiscale Study of the Epitaxial CVD of Si from Chlorosilanes
- Micro and macro scale technique for strongly coupled two-phase flows simulation
- Assessment of conservative weighting scheme in simulating chemical vapour deposition with trace species
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