Modeling and control of a semiconductor manufacturing process with an automata network: An example in plasma etch processing

DOI10.1016/0305-0548(95)00062-3MaRDI QIDQ1915979zbMATH OpenOpenAlexFDO

Authors Edward A. Rietman, Suresh H. Patel, Earl R. Lory

Publication date 1 July 1996

Published in Computers \& Operations Research (Search for Journal in Brave)

Full work available at URL https://doi.org/10.1016/0305-0548(95)00062-3

zbMATH Keywords

modeling and control of processesneural network

Mathematics Subject Classification ID

Production models (90B30) Case-oriented studies in operations research (90B90) Neural networks for/in biological studies, artificial life and related topics (92B20)

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Cites work

• A logical calculus of the ideas immanent in nervous activity
• scientific article; zbMATH DE number 203652 (Why is no real title available?)
• scientific article; zbMATH DE number 3314813 (Why is no real title available?)
• Learning process in an asymmetric threshold network

Cited in

(5)

• A bibliography of neural network business applications research: 1994--1998
• Modeling and simulation of thermal chlorine etching of gallium arsenide with application to real-time feedback control
• Neural network structures for optimal control of LPCVD reactors.
• An Elementary Model for Control of a Semiconductor Etching Process
• Advances in Neural Networks – ISNN 2005

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