Numerical study on photoresist etching processes based on a cellular automata model

DOI10.1007/s11431-007-0005-5zbMath1258.74054OpenAlexW1899462916MaRDI QIDQ1940807

Zaifa Zhou, Wei Lu, Qingan Huang, Wei-Hua Li

Publication date: 7 March 2013

Published in: Science in China. Series E (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1007/s11431-007-0005-5

zbMATH Keywords

cellular automatamodelprocess simulationoptical lithography simulation

Mathematics Subject Classification ID

Cellular automata (computational aspects) (68Q80) Chemical structure in solid mechanics (74E40)

Cites Work

• Statistical mechanics of cellular automata

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