Modeling reactive magnetron sputtering: a survey of different modeling approaches

DOI10.2478/AUSI-2020-0008zbMATH Open1458.93054OpenAlexW3068953202MaRDI QIDQ2220239FDOQ2220239

Authors: Rossi Róbert Madarász, András Kelemen, Péter Kádár 

Publication date: 22 January 2021

Published in: Acta Universitatis Sapientiae. Informatica (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.2478/ausi-2020-0008

Recommendations

• Study and simulation of the sputtering process of material layers in plasma
• Plasma Carburization of an Axisymmetric Steel Sample
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• scientific article; zbMATH DE number 2119799

zbMATH Keywords

parameter identificationcontrol theorymathematical modelingcomputer simulationreactive magnetron sputtering

Mathematics Subject Classification ID

System identification (93B30) Application models in control theory (93C95) Mathematical modeling or simulation for problems pertaining to systems and control theory (93-10)

Cited In (4)

• Understanding the contribution of energy and angular distribution in the morphology of thin films using Monte Carlo simulation
• Three-dimensional magnetic field analyses on the magnetron sputtering system by using Free Mesh Method
• Model of the coating growth under the conditions of magnetron sputtering deposition
• Reactive magnetron sputter deposition of (Ti, Cu)N nano-crystalline thin films: modeling of particle and energy flux toward the substrate

Uses Software

• Tridyn
• Kalypso
• PTSIM

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