Fluid flow and transport processes in a large area atmospheric pressure stagnation flow CVD reactor for deposition of thin films

DOI10.1016/j.ijheatmasstransfer.2004.06.012zbMath1098.76646OpenAlexW2003250597MaRDI QIDQ2573672

Publication date: 22 November 2005

Published in: International Journal of Heat and Mass Transfer (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1016/j.ijheatmasstransfer.2004.06.012

zbMATH Keywords

Computer simulation Fluid flows Chemical vapor deposition processes

Mathematics Subject Classification ID

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