Efficient optimization of process parameters in shadow mask manufacturing using NNPLS and genetic algorithm
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Publication:3369505
DOI10.1080/00958970500137167zbMath1082.90519OpenAlexW2122127309MaRDI QIDQ3369505
Jaewook Lee, Hyunbo Cho, Buhwan Jeong
Publication date: 2 February 2006
Published in: International Journal of Production Research (Search for Journal in Brave)
Full work available at URL: https://doi.org/10.1080/00958970500137167
genetic algorithmneural network partial least-squares (NNPLS)process parameter optimizationshadow-mask manufacturing processvariable importance index
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