Contour: A Process Variation Aware Wear-Leveling Mechanism for Inodes of Persistent Memory File Systems

DOI10.1109/TC.2020.3002537MaRDI QIDQ3389882zbMATH OpenOpenAlexFDO

Authors Xianzhang Chen, Xinxin Wang, Chaoshu Yang, Weiwen Jiang, Qingfeng Zhuge, Edwin H.-M. Sha

Publication date 23 March 2022

Published in IEEE Transactions on Computers (Search for Journal in Brave)

Full work available at URL https://doi.org/10.1109/tc.2020.3002537

Mathematics Subject Classification ID

Computer science (68-XX)

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