Diffusional relaxation in random sequential deposition

DOI10.1088/0305-4470/30/9/003zbMATH Open0939.82017arXivcond-mat/9610181OpenAlexW3124476632WikidataQ59739635 ScholiaQ59739635MaRDI QIDQ4232162FDOQ4232162

Authors: E. Eisenberg, Asher Baram 

Publication date: 18 May 1999

Published in: Journal of Physics A: Mathematical and General (Search for Journal in Brave)

Abstract: The effect of diffusional relaxation on the random sequential deposition process is studied in the limit of fast deposition. Expression for the coverage as a function of time are analytically derived for both the short-time and long-time regimes. These results are tested and compared with numerical simulations.

Full work available at URL: https://arxiv.org/abs/cond-mat/9610181

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zbMATH Keywords

diffusional relaxationrandom sequential deposition process

Mathematics Subject Classification ID

Random walks, random surfaces, lattice animals, etc. in equilibrium statistical mechanics (82B41)

Cited In (1)

• Deposition-evaporation stochastic systems in two and higher dimensions.

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