A new approach for shape optimization of resistors with complex geometry
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Publication:4665495
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Cites work
- A level set approach to a unified model for etching, deposition, and lithography. I: Algorithms and two-dimensional simulations
- Fronts propagating with curvature-dependent speed: Algorithms based on Hamilton-Jacobi formulations
- Object‐oriented three‐dimensional hybrid grid generation
- Structural boundary design via level set and immersed interface methods
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