A study of uniformity pattern for extended designs

DOI10.1080/03610926.2017.1343843MaRDI QIDQ5160220zbMATH OpenOpenAlexFDO

Authors Tingxun Gou, Hong Qin, Kashinath Chatterjee

Publication date 28 October 2021

Published in Communications in Statistics: Theory and Methods (Search for Journal in Brave)

Full work available at URL https://doi.org/10.1080/03610926.2017.1343843

zbMATH Keywords

lower boundprojection discrepancycentered \(L_2\)-discrepancytwo-level uniform design

Mathematics Subject Classification ID

Factorial statistical designs (62K15)

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Cites work

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• Experiments. Planning, analysis and optimization.
• Minimum projection uniformity criterion and its application
• Miscellanea. A connection between uniformity and aberration in regular fractions of two-level factorials
• Multiplier ideal sheaves in complex and algebraic geometry
• On the optimality of orthogonal array plus one run plans
• Optimal Additions to and Deletions from Two-Level Orthogonal Arrays
• Sequential Design for Microarray Experiments
• Some new lower bounds to centered and wrap-round \(L_2\)-discrepancies
• Uniform Design: Theory and Application
• Uniform designs limit aliasing
• Uniform sliced Latin hypercube designs
• Uniformity pattern and related criteria for q-level factorials

Cited in

(6)

• Theory and application of uniform designs
• A new class of two-level optimal extended designs
• Projection uniformity under mixture discrepancy
• A new extension strategy on three-level factorials under wrap-around \(L_2\)-discrepancy
• Uniform three-level extended designs
• Projection uniformity of nearly balanced designs

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