On refinement masks of tight wavelet frames
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Abstract: In the paper we obtain sufficient conditions for a trigonometric polynomial to be a refinement mask corresponding to a tight wavelet frame. The condition is formulated in terms of the roots of a mask. In particular, it is proved that any trigonometric polynomial can serve as a mask if its associated algebraic polynomial has only negative roots (at least one of them, of course, equals ).
In this paper, the authors use the Unitary Extention Principle of \textit{A. Ron} and \textit{Z. Shen} [J. Funct. Anal. 148, No. 2, 408--447 (1997; Zbl 0891.42018)] to construct tight wavelet frames. They give conditions on the roots of a polynomial mask and then directly prove (computations) that these conditions are sufficient to obtain a tight wavelet frame.
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Cites work
Cited in
(12)- Construction and reconstruction of tight framelets and wavelets via matrix mask functions
- Parameterizations of masks for tight affine frames with two symmetric/antisymmetric generators
- Symmetric framelets
- Tight wavelet frames in low dimensions with canonical filters
- Existence of matrix-valued multiresolution analysis-based matrix-valued tight wavelet frames
- Wavelet frames and image restorations
- An algebraic perspective on multivariate tight wavelet frames
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