Computing light masks in neutral atom lithography
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Publication:860316
DOI10.1016/j.jcp.2006.07.012zbMath1106.78010MaRDI QIDQ860316
Carsten Burstedde, Angela Kunoth, Jürgen Braun
Publication date: 9 January 2007
Published in: Journal of Computational Physics (Search for Journal in Brave)
Full work available at URL: https://doi.org/10.1016/j.jcp.2006.07.012
Fourier transform; nonlinear inverse problem; atom lithography; light mask; Nelder and Mead simplex method
78A60: Lasers, masers, optical bistability, nonlinear optics
65T99: Numerical methods in Fourier analysis
Cites Work