Application of minimum projection uniformity criterion in complementary designs for q-level factorials

DOI10.1007/S11464-015-0446-2zbMATH Open1328.62494OpenAlexW2031520830MaRDI QIDQ893329FDOQ893329

Authors: Hong Qin, Zhenghong Wang 

Publication date: 19 November 2015

Published in: Frontiers of Mathematics in China (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1007/s11464-015-0446-2

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zbMATH Keywords

uniformity patterncomplementary designdiscrete discrepancyminimum projection uniformity (MPU)

Mathematics Subject Classification ID

Optimal statistical designs (62K05) Factorial statistical designs (62K15)

Cites Work

• Generalized minimum aberration for asymmetrical fractional factorial designs
• Discrete discrepancy in factorial designs
• Uniformity pattern and related criteria for two-level factorials
• Minimum projection uniformity criterion and its application
• Connections among different criteria for asymmetrical fractional factorial designs
• Uniformity pattern and related criteria for \(q\)-level factorials
• Uniform designs limit aliasing
• Lower Bounds for the Uniformity Pattern of Asymmetric Fractional Factorials
• Application of minimum projection uniformity criterion in complementary designs
• Some identities on \(q^{n-m}\) designs with application to minimum aberration designs
• Minimum \(G_2\)-aberration for nonregular fractional factorial designs
• Construction of supersaturated design with large number of factors by the complementary design method
• Multi-level \(k\)-circulant supersaturated designs
• On the existence of saturated and nearly saturated asymmetrical orthogonal arrays
• Characterization of minimum aberration \(2^{n-k}\) designs in terms of their complementary designs
• Complementary design theory for sliced equidistance designs
• Characterization of generalized aberration of some designs in terms of their complementary designs

Cited In (4)

• Application of minimum projection uniformity criterion in complementary designs
• Complementary design theory for sliced equidistance designs
• Design efficiency for minimum projection uniformity designs with two levels
• Design efficiency for minimum projection uniform designs with \(q\) levels

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