Application of minimum projection uniformity criterion in complementary designs for q-level factorials

DOI10.1007/S11464-015-0446-2MaRDI QIDQ893329zbMATH OpenOpenAlexFDO

Authors Hong Qin, Zhenghong Wang

Publication date 19 November 2015

Published in Frontiers of Mathematics in China (Search for Journal in Brave)

Full work available at URL https://doi.org/10.1007/s11464-015-0446-2

zbMATH Keywords

uniformity patterncomplementary designdiscrete discrepancyminimum projection uniformity (MPU)

Mathematics Subject Classification ID

Optimal statistical designs (62K05) Factorial statistical designs (62K15)

Recommendations

• Application of minimum projection uniformity criterion in complementary designs
• Minimum projection uniformity criterion and its application
• Uniformity pattern and its applications in experimental designs
• Uniformity pattern of \(q\)-level factorials under mixture discrepancy
• Uniformity pattern and related criteria for q-level factorials

Cites work

• Application of minimum projection uniformity criterion in complementary designs
• Characterization of generalized aberration of some designs in terms of their complementary designs
• Characterization of minimum aberration \(2^{n-k}\) designs in terms of their complementary designs
• Complementary design theory for sliced equidistance designs
• Connections among different criteria for asymmetrical fractional factorial designs
• Construction of supersaturated design with large number of factors by the complementary design method
• Discrete discrepancy in factorial designs
• Generalized minimum aberration for asymmetrical fractional factorial designs
• Lower Bounds for the Uniformity Pattern of Asymmetric Fractional Factorials
• Minimum \(G_2\)-aberration for nonregular fractional factorial designs
• Minimum projection uniformity criterion and its application
• Multi-level \(k\)-circulant supersaturated designs
• On the existence of saturated and nearly saturated asymmetrical orthogonal arrays
• Some identities on \(q^{n-m}\) designs with application to minimum aberration designs
• Uniform designs limit aliasing
• Uniformity pattern and related criteria for \(q\)-level factorials
• Uniformity pattern and related criteria for two-level factorials

Cited in

(4)

• Design efficiency for minimum projection uniformity designs with two levels
• Design efficiency for minimum projection uniform designs with \(q\) levels
• Complementary design theory for sliced equidistance designs
• Application of minimum projection uniformity criterion in complementary designs

This page was built for publication: Application of minimum projection uniformity criterion in complementary designs for \(q\)-level factorials

Report a bug (only for logged in users!)Click here to report a bug for this page (MaRDI item Q893329)