Analysis of a model for imaging in photolithography
From MaRDI portal
Publication:909139
DOI10.1016/0022-247X(89)90372-7zbMath0694.35209MaRDI QIDQ909139
Publication date: 1989
Published in: Journal of Mathematical Analysis and Applications (Search for Journal in Brave)
limiting absorption principle; contraction mapping theorem; photolithography; time dependent Maxwell equation
35K55: Nonlinear parabolic equations
35Q99: Partial differential equations of mathematical physics and other areas of application
Cites Work