Two-layer spin coating flow of Newtonian liquids: a computational study

DOI10.1016/J.COMPFLUID.2016.03.016MaRDI QIDQ1646921zbMATH OpenOpenAlexFDO

Authors Subhadarshinee Sahoo, Akash Arora, Pankaj Doshi

Publication date 26 June 2018

Published in Computers and Fluids (Search for Journal in Brave)

Full work available at URL https://doi.org/10.1016/j.compfluid.2016.03.016

zbMATH Keywords

axisymmetric flowmathematical modelingmulti-layer coatingprecursor layer modelthin-film flowtwo-layer spin coating

Mathematics Subject Classification ID

Thin fluid films (76A20) Lubrication theory (76D08) Capillarity (surface tension) for incompressible viscous fluids (76D45)

Recommendations

• Spin-coating of vertically stratified thin liquid films
• Spreading of thin liquid droplets on rotating disks
• Spin coating of capillary tubes
• Spin coating of non-Newtonian fluids
• Asymptotic analysis of the formation of thin liquid film in spin coating

Cites work

• Flow of a Viscous Liquid on a Rotating Disk
• Frontal solution program for unsymmetric matrices
• scientific article; zbMATH DE number 3698599 (Why is no real title available?)
• scientific article; zbMATH DE number 3438337 (Why is no real title available?)
• On the Flow of a Non-Newtonian Liquid on a Rotating Disk
• Spin-coating of vertically stratified thin liquid films
• Stability of Newtonian and viscoelastic dynamic contact lines
• The effect of the Coriolis force on axisymmetric rotating thin film flows
• The frontal method in hydrodynamics simulations
• The rate of spreading in spin coating
• Two-layer film flow over a rotating disk

Cited in

(6)

• Two-layer film flow on a rough rotating disk in the presence of air shear
• The fluid profile during spin-coating over a small sinusoidal topography
• Spin-coating of vertically stratified thin liquid films
• Comment on “Coating flow of viscous Newtonian liquids on a rotating vertical disk” [Phys. Fluids 21, 103102 (2009)]
• scientific article; zbMATH DE number 33598 (Why is no real title available?)
• Development of a new simulation model of spin coating process and its application to optimize the 450 mm wafer coating process

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