A level set approach to a unified model for etching, deposition, and lithography. I: Algorithms and two-dimensional simulations (Q1902653): Difference between revisions
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| Property / DOI: 10.1006/jcph.1995.1153 / rank | |||
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| Property / reviewed by: Q917236 / rank | |||
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| Property / reviewed by: Snezhana Georgieva Gocheva-Ilieva / rank | |||
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| Property / MaRDI profile type: MaRDI publication profile / rank | |||
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| Property / full work available at URL: https://doi.org/10.1006/jcph.1995.1153 / rank | |||
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| Property / OpenAlex ID: W2022218976 / rank | |||
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| Property / DOI: 10.1006/JCPH.1995.1153 / rank | |||
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Latest revision as of 12:33, 16 December 2024
scientific article
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | A level set approach to a unified model for etching, deposition, and lithography. I: Algorithms and two-dimensional simulations |
scientific article |
Statements
A level set approach to a unified model for etching, deposition, and lithography. I: Algorithms and two-dimensional simulations (English)
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7 January 1996
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A model of a surface advancement in two-dimensional topography simulation is considered. It consists of a Hamilton-Jacoby type equation as a level set equation of motion, appropriate conditions and speed functions. Many numerical tests are presented.
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etching
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lithography
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numerical examples
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surface advancement
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topography simulation
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Hamilton-Jacoby type equation
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level set equation of motion
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