A theory of pad conditioning for chemical-mechanical polishing (Q2567349): Difference between revisions
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| Property / author: Thomas P. Witelski / rank | |||
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| Property / author: Colin P. Please / rank | |||
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| Property / author: Donald W. Schwendeman / rank | |||
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| Property / author: Thomas P. Witelski / rank | |||
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| Property / author: Donald W. Schwendeman / rank | |||
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| Property / full work available at URL: https://doi.org/10.1023/b:engi.0000042116.09084.00 / rank | |||
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Latest revision as of 11:21, 30 July 2024
scientific article
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | A theory of pad conditioning for chemical-mechanical polishing |
scientific article |
Statements
A theory of pad conditioning for chemical-mechanical polishing (English)
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4 October 2005
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abrasive wear
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surface-height probability density function
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integral equation
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