A level set approach to a unified model for etching, deposition, and lithography. III: Redeposition, reemission, surface diffusion, and complex simulations (Q1377900): Difference between revisions
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Revision as of 20:54, 21 February 2024
scientific article
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | A level set approach to a unified model for etching, deposition, and lithography. III: Redeposition, reemission, surface diffusion, and complex simulations |
scientific article |
Statements
A level set approach to a unified model for etching, deposition, and lithography. III: Redeposition, reemission, surface diffusion, and complex simulations (English)
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17 February 1998
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level set formulation
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topography simulation
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deposition, etching, and lithography processes
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integrated circuit fabrication
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Hamilton-Jacobi type equation
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propagating level set function
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hyperbolic conservation laws
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redeposition
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reemission
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surface diffusion
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transport equations
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thin film layers
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