A theory of pad conditioning for chemical-mechanical polishing (Q2567349): Difference between revisions
From MaRDI portal
Added link to MaRDI item. |
Removed claims |
||
| Property / author | |||
| Property / author: Thomas P. Witelski / rank | |||
| Property / author | |||
| Property / author: Colin P. Please / rank | |||
| Property / author | |||
| Property / author: Donald W. Schwendeman / rank | |||
Revision as of 09:11, 11 February 2024
scientific article
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | A theory of pad conditioning for chemical-mechanical polishing |
scientific article |
Statements
A theory of pad conditioning for chemical-mechanical polishing (English)
0 references
4 October 2005
0 references
abrasive wear
0 references
surface-height probability density function
0 references
integral equation
0 references
