Numerical study on photoresist etching processes based on a cellular automata model (Q1940807): Difference between revisions
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Revision as of 14:08, 21 February 2024
scientific article
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | Numerical study on photoresist etching processes based on a cellular automata model |
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Numerical study on photoresist etching processes based on a cellular automata model (English)
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7 March 2013
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cellular automata
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process simulation
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optical lithography simulation
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model
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