Analysis of a model for imaging in photolithography (Q909139)

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Analysis of a model for imaging in photolithography
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    title
    Analysis of a model for imaging in photolithography (English)
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    author
    H. P. Urbach
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    publication date
    1989
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    zbMATH DE Number
    4136617
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    zbMATH Keywords
    time dependent Maxwell equation
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    photolithography
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    limiting absorption principle
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    contraction mapping theorem
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