A novel approach to hedge and compensate the critical dimension variation of the developed-and-etched circuit patterns for yield enhancement in semiconductor manufacturing (Q337307)
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scientific article
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | A novel approach to hedge and compensate the critical dimension variation of the developed-and-etched circuit patterns for yield enhancement in semiconductor manufacturing |
scientific article |
Statements
A novel approach to hedge and compensate the critical dimension variation of the developed-and-etched circuit patterns for yield enhancement in semiconductor manufacturing (English)
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10 November 2016
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critical dimension
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yield enhancement
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tool affinity
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tool dispatching
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feed-forward control
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run-to-run (R2R)
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manufacturing intelligence
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