A novel approach to hedge and compensate the critical dimension variation of the developed-and-etched circuit patterns for yield enhancement in semiconductor manufacturing

DOI10.1016/j.cor.2014.05.009zbMath1348.90439MaRDI QIDQ337307

Mohammad Hasan, M. Dambrine

Publication date: 10 November 2016

Published in: Computers \& Operations Research (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1016/j.cor.2014.05.009

zbMATH Keywords

critical dimension; feed-forward control; manufacturing intelligence; run-to-run (R2R); tool affinity; tool dispatching; yield enhancement

Mathematics Subject Classification ID

90C35: Programming involving graphs or networks

90B30: Production models

90B90: Case-oriented studies in operations research