An Alternating Direction Method of Multipliers for Inverse Lithography Problem

DOI10.4208/NMTMA.OA-2022-0151MaRDI QIDQ6191763zbMATH OpenFDO

Authors Junqing Chen, Haibo Liu

Publication date 11 March 2024

Published in Numerical Mathematics: Theory, Methods and Applications (Search for Journal in Brave)

Full work available at URL https://arxiv.org/abs/2209.10814

zbMATH Keywords

ADMM frameworkinverse lithography techniquestotal variation regularization

Mathematics Subject Classification ID

Inverse problems (including inverse scattering) in optics and electromagnetic theory (78A46) Optimization problems in optics and electromagnetic theory (78M50)

Abstract: We propose an alternating direction method of multipliers (ADMM) to solve an optimization problem stemming from inverse lithography. The objective functional of the optimization problem includes three terms: the misfit between the imaging on wafer and the target pattern, the penalty term which ensures the mask is binary and the total variation regularization term. By variable splitting, we introduce an augmented Lagrangian for the original objective functional. In the framework of ADMM method, the optimization problem is divided into several subproblems. Each of the subproblems can be solved efficiently. We give the convergence analysis of the proposed method. Specially, instead of solving the subproblem concerning sigmoid, we solve directly the threshold truncation imaging function which can be solved analytically. We also provide many numerical examples to illustrate the effectiveness of the method.

Recommendations

• Alternating direction method of multipliers for linear inverse problems
• A robust computational algorithm for inverse photomask synthesis in optical projection lithography
• A variational approach to the inverse photolithography problem
• Fast alternating direction multipliers method by generalized Krylov subspaces
• A parallel alternating direction method with application to compound \(l_{1}\)-regularized imaging inverse problems

Cites work

• A dual algorithm for the solution of nonlinear variational problems via finite element approximation
• A Nonlinear Primal-Dual Method for Total Variation-Based Image Restoration
• A robust computational algorithm for inverse photomask synthesis in optical projection lithography
• A splitting method for orthogonality constrained problems
• Alternating direction methods for classical and ptychographic phase retrieval
• An algorithm for total variation minimization and applications
• An Augmented Lagrangian Method for Identifying Discontinuous Parameters in Elliptic Systems
• An Iterative Regularization Method for Total Variation-Based Image Restoration
• Edge-preserving and scale-dependent properties of total variation regularization
• Global convergence of ADMM in nonconvex nonsmooth optimization
• Gradient-Based Source and Mask Optimization in Optical Lithography
• scientific article; zbMATH DE number 936298 (Why is no real title available?)
• scientific article; zbMATH DE number 5060482 (Why is no real title available?)
• Image Processing and Analysis
• Lectures on convex optimization
• The Split Bregman Method for L1-Regularized Problems

This page was built for publication: An Alternating Direction Method of Multipliers for Inverse Lithography Problem

Report a bug (only for logged in users!)Click here to report a bug for this page (MaRDI item Q6191763)