Gradient-Based Source and Mask Optimization in Optical Lithography

DOI10.1109/TIP.2011.2131668MaRDI QIDQ5370244zbMATH OpenOpenAlexWikidataFDO

Authors Yao Peng, Jinyu Zhang, Yan Wang, Zhiping Yu

Publication date 19 October 2017

Published in IEEE Transactions on Image Processing (Search for Journal in Brave)

Full work available at URL https://doi.org/10.1109/tip.2011.2131668

Mathematics Subject Classification ID

Geometric optics (78A05) Image processing (compression, reconstruction, etc.) in information and communication theory (94A08) Source coding (94A29)

Cited in

(3)

• Sequencing optimisation for makespan improvement at wet-etch tools
• An Alternating Direction Method of Multipliers for Inverse Lithography Problem
• Topology optimization for optical microlithography with partially coherent illumination

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