Gradient-Based Source and Mask Optimization in Optical Lithography (Q5370244)
From MaRDI portal
!
This is the item page for this Wikibase entity, intended for internal use and editing purposes. Please use the normal view instead:
scientific article; zbMATH DE number 6793640
| Language | Label | Description | Also known as |
|---|---|---|---|
| default for all languages | No label defined |
||
| English | Gradient-Based Source and Mask Optimization in Optical Lithography |
scientific article; zbMATH DE number 6793640 |
Statements
Gradient-Based Source and Mask Optimization in Optical Lithography (English)
0 references
19 October 2017
0 references
