Topology optimization for optical microlithography with partially coherent illumination
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Publication:6565207
DOI10.1002/NME.5299zbMATH Open1548.74635MaRDI QIDQ6565207FDOQ6565207
Authors: M. D. Zhou, B. S. Lazarov, Ole Sigmund 
Publication date: 1 July 2024
Published in: International Journal for Numerical Methods in Engineering (Search for Journal in Brave)
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MEMStopology optimizationoptical microlithographypartially coherent illuminationrobust source and mask optimization
Cites Work
- Generating optimal topologies in structural design using a homogenization method
- Achieving minimum length scale in topology optimization using nodal design variables and projection functions
- Filters in topology optimization
- The method of moving asymptotes—a new method for structural optimization
- Volume preserving nonlinear density filter based on Heaviside functions
- On projection methods, convergence and robust formulations in topology optimization
- Gradient-Based Source and Mask Optimization in Optical Lithography
- Topology synthesis of large-displacement compliant mechanisms
- Minimum length scale in topology optimization by geometric constraints
- Topology optimization considering material and geometric uncertainties using stochastic collocation methods
- A robust computational algorithm for inverse photomask synthesis in optical projection lithography
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