A robust computational algorithm for inverse photomask synthesis in optical projection lithography

DOI10.1137/110830356zbMATH Open1250.65081OpenAlexW1973654887MaRDI QIDQ2912286FDOQ2912286

Authors Siu Kai Choy, Ningning Jia, Chong Sze Tong, Man-Lai Tang, Edmund Y. Lam 

Publication date 14 September 2012

Published in SIAM Journal on Imaging Sciences (Search for Journal in Brave)

Full work available at URL http://hdl.handle.net/10722/152663

zbMATH Keywords

total variationregularizationalgorithmimage synthesisChambolle's fast duality projection algorithminverse lithography

Mathematics Subject Classification ID

Numerical optimization and variational techniques (65K10) Existence theories for optimal control problems involving partial differential equations (49J20) Numerical methods involving duality (49M29)

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Cited in

(7)

• A variational approach to the inverse photolithography problem
• Analysis of an inverse problem arising in photolithography
• Modeling of mask diffraction and projection imaging for advanced optical and EUV lithography
• Computing light masks in neutral atom lithography
• Application of optical proximity correction technology
• Topology optimization for optical microlithography with partially coherent illumination
• An Alternating Direction Method of Multipliers for Inverse Lithography Problem

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