A robust computational algorithm for inverse photomask synthesis in optical projection lithography
DOI10.1137/110830356zbMATH Open1250.65081OpenAlexW1973654887MaRDI QIDQ2912286FDOQ2912286
Authors: Siu Kai Choy, Ningning Jia, Chong Sze Tong, Man-Lai Tang, Edmund Y. Lam 
Publication date: 14 September 2012
Published in: SIAM Journal on Imaging Sciences (Search for Journal in Brave)
Full work available at URL: http://hdl.handle.net/10722/152663
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- A Variational Approach to the Inverse Photolithography Problem
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- An Alternating Direction Method of Multipliers for Inverse Lithography Problem
- Analysis of an inverse problem arising in photolithography
- Modeling of mask diffraction and projection imaging for advanced optical and EUV lithography
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