ANALYSIS OF AN INVERSE PROBLEM ARISING IN PHOTOLITHOGRAPHY
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Publication:2884806
DOI10.1142/S0218202511500266zbMath1237.49059arXiv1002.4059MaRDI QIDQ2884806
Publication date: 18 May 2012
Published in: Mathematical Models and Methods in Applied Sciences (Search for Journal in Brave)
Full work available at URL: https://arxiv.org/abs/1002.4059
Applications of optimal control and differential games (49N90) Methods involving semicontinuity and convergence; relaxation (49J45) Optimization of shapes other than minimal surfaces (49Q10) Inverse problems in optimal control (49N45)
Related Items (3)
A Variational Approach to the Inverse Photolithography Problem ⋮ Maximum Flows and Minimum Cuts in the Plane ⋮ Maximum flows and minimum cuts in the plane
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- Optimal stability estimates for the determination of defects by electrostatic measurements
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