A robust computational algorithm for inverse photomask synthesis in optical projection lithography (Q2912286)
From MaRDI portal
 | This is the item page for this Wikibase entity, intended for internal use and editing purposes. Please use this page instead for the normal view: A robust computational algorithm for inverse photomask synthesis in optical projection lithography |
scientific article; zbMATH DE number 6082573
| Language | Label | Description | Also known as |
|---|---|---|---|
| default for all languages | No label defined |
||
| English | A robust computational algorithm for inverse photomask synthesis in optical projection lithography |
scientific article; zbMATH DE number 6082573 |
Statements
14 September 2012
0 references
inverse lithography
0 references
image synthesis
0 references
total variation
0 references
algorithm
0 references
regularization
0 references
Chambolle's fast duality projection algorithm
0 references
A robust computational algorithm for inverse photomask synthesis in optical projection lithography (English)
0 references
0.8173040747642517
0 references
0.7790882587432861
0 references
0.6752623319625854
0 references
0.6676755547523499
0 references
0.6572949886322021
0 references
