Discrete Relaxation Method for Triple Patterning Lithography Layout Decomposition
From MaRDI portal
Recommendations
- Positive semidefinite relaxation and approximation algorithm for triple patterning lithography
- Optimal three-dimensional VLSI layouts
- Aperiodic Array Layout Optimization by the Constraint Relaxation Approach
- Direct relaxation of optimal layout problems for plates
- scientific article; zbMATH DE number 4121435
- scientific article; zbMATH DE number 3845502
This page was built for publication: Discrete Relaxation Method for Triple Patterning Lithography Layout Decomposition
Report a bug (only for logged in users!)Click here to report a bug for this page (MaRDI item Q2989515)