Positive semidefinite relaxation and approximation algorithm for triple patterning lithography

DOI10.1007/978-3-319-13075-0_29MaRDI QIDQ2942644zbMATH OpenOpenAlexFDO

Authors Yukihide Kohira, Chikaaki Kodama, Atsushi Takahashi, Tomomi Matsui

Publication date 11 September 2015

Published in Algorithms and Computation (Search for Journal in Brave)

Full work available at URL https://doi.org/10.1007/978-3-319-13075-0_29

zbMATH Keywords

approximation algorithmpositive semidefinite relaxationtriple patterning

Mathematics Subject Classification ID

Approximation algorithms (68W25)

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Cited in

(1)

• Discrete Relaxation Method for Triple Patterning Lithography Layout Decomposition

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