A level set approach to a unified model for etching, deposition, and lithography. II: Three-dimensional simulations (Q1908745)
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scientific article; zbMATH DE number 851745
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| English | A level set approach to a unified model for etching, deposition, and lithography. II: Three-dimensional simulations |
scientific article; zbMATH DE number 851745 |
Statements
A level set approach to a unified model for etching, deposition, and lithography. II: Three-dimensional simulations (English)
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30 June 1996
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finite difference method
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level set formulation
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three-dimensional topography simulation
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lithography
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integrated circuit fabrication
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Hamilton-Jacobi-type equation
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hyperbolic conservation laws
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equations of motion
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etching
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visibility
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surface diffusion
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reflection
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algorithms
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deposition
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source flux functions
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0.9561360478401184
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0.9195088744163512
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0.7948404550552368
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