A level set approach to a unified model for etching, deposition, and lithography. II: Three-dimensional simulations

DOI10.1006/jcph.1995.1221zbMath0840.65131OpenAlexW2091510311MaRDI QIDQ1908745

James A. Sethian, David Adalsteinsson

Publication date: 30 June 1996

Published in: Journal of Computational Physics (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1006/jcph.1995.1221

zbMATH Keywords

algorithms reflection finite difference method surface diffusion equations of motion hyperbolic conservation laws deposition visibility etching lithography level set formulation Hamilton-Jacobi-type equation integrated circuit fabrication source flux functions three-dimensional topography simulation

Mathematics Subject Classification ID

Lua error in Module:PublicationMSCList at line 37: attempt to index local 'msc_result' (a nil value).

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