A level set approach to a unified model for etching, deposition, and lithography. II: Three-dimensional simulations
DOI10.1006/JCPH.1995.1221zbMATH Open0840.65131OpenAlexW2091510311MaRDI QIDQ1908745FDOQ1908745
James Sethian, David Adalsteinsson
Publication date: 30 June 1996
Published in: Journal of Computational Physics (Search for Journal in Brave)
Full work available at URL: https://doi.org/10.1006/jcph.1995.1221
algorithmsfinite difference methodhyperbolic conservation lawsreflectionequations of motionvisibilityetchinglithographysurface diffusiondepositionlevel set formulationHamilton-Jacobi-type equationintegrated circuit fabricationsource flux functionsthree-dimensional topography simulation
Probabilistic models, generic numerical methods in probability and statistics (65C20) Higher-order parabolic equations (35K25) Hyperbolic conservation laws (35L65) Finite difference methods for initial value and initial-boundary value problems involving PDEs (65M06) Initial value problems for linear higher-order PDEs (35G10) Applications to the sciences (65Z05)
Cited In (22)
- Implementation and evaluation of the level set method: towards efficient and accurate simulation of wet etching for microengineering applications
- Surface evolution in bare bamboo-type metal lines under diffusion and electric field effects
- A fast algorithm for automatic segmentation and extraction of a single object by active surfaces
- Efficient Algorithms for Tracking Moving Interfaces in Industrial Applications: Inkjet Plotters, Electrojetting, Industrial Foams, and Rotary Bell Painting
- Sparse field level set method for non-convex Hamiltonians in 3D plasma etching profile simulations
- Amorphous surface growth via a level set approach
- Application of the level set method for the visual representation of continuous cellular automata oriented to anisotropic wet etching
- Computation for electromigration in interconnects of microelectronic devices
- Level set methods: An overview and some recent results
- A free-convection boundary-layer model for the centrifugal etching of an axisymmetric cavity
- A local information based variational model for selective image segmentation
- Simulation of the postexposure bake process of chemically amplified resists by reaction-diffusion equations
- Curve evolution models for real-time identification with application to plasma etching
- A level-set method for convective-diffusive particle deposition
- Evolution, implementation, and application of level set and fast marching methods for advancing fronts
- Growth, structure and pattern formation for thin films
- Electromigration of intergranular voids in metal films for microelectronic interconnects.
- Numerical schemes for the Hamilton-Jacobi and level set equations on triangulated domains
- A level set approach to a unified model for etching, deposition, and lithography. III: Redeposition, reemission, surface diffusion, and complex simulations
- A level-set method for simulating island coarsening
- A level set approach to a unified model for etching, deposition, and lithography. I: Algorithms and two-dimensional simulations
- The fast construction of extension velocities in level set methods
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