Simulation of the postexposure bake process of chemically amplified resists by reaction-diffusion equations
DOI10.1006/jcph.2001.6881zbMath0987.65079OpenAlexW2012245497MaRDI QIDQ5953236
Publication date: 27 January 2002
Published in: Journal of Computational Physics (Search for Journal in Brave)
Full work available at URL: https://doi.org/10.1006/jcph.2001.6881
polymersreaction-diffusion equationsalternating direction implicit methodacidschemically amplified resistsDUV lithographyerror-controlpostexposure bake
Reaction-diffusion equations (35K57) Statistical mechanics of polymers (82D60) Finite difference methods for initial value and initial-boundary value problems involving PDEs (65M06) Chemically reacting flows (80A32) Error bounds for initial value and initial-boundary value problems involving PDEs (65M15)
Cites Work
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