Simulation of the postexposure bake process of chemically amplified resists by reaction-diffusion equations (Q5953236)
From MaRDI portal
scientific article; zbMATH DE number 1691260
Language | Label | Description | Also known as |
---|---|---|---|
English | Simulation of the postexposure bake process of chemically amplified resists by reaction-diffusion equations |
scientific article; zbMATH DE number 1691260 |
Statements
Simulation of the postexposure bake process of chemically amplified resists by reaction-diffusion equations (English)
0 references
27 January 2002
0 references
postexposure bake
0 references
chemically amplified resists
0 references
DUV lithography
0 references
reaction-diffusion equations
0 references
polymers
0 references
acids
0 references
alternating direction implicit method
0 references
error-control
0 references