Implementation and evaluation of the level set method: towards efficient and accurate simulation of wet etching for microengineering applications

DOI10.1016/J.CPC.2013.05.016MaRDI QIDQ6556352zbMATH OpenFDO

Authors C. Montoliu, Néstor Ferrando, M. A. Gosálvez, J. Cerdá, R. J. Colom

Publication date 17 June 2024

Published in Computer Physics Communications (Search for Journal in Brave)

zbMATH Keywords

cellular automatalevel set methodMEMSparallel computingGPUsparse field methodanisotropic wet chemical etchingmicroengineering

Mathematics Subject Classification ID

Fluid mechanics (76-XX) Computer science (68-XX)

Cites work

• A fast level set method for propagating interfaces
• A level set approach to a unified model for etching, deposition, and lithography. I: Algorithms and two-dimensional simulations
• A level set approach to a unified model for etching, deposition, and lithography. II: Three-dimensional simulations
• A level set approach to a unified model for etching, deposition, and lithography. III: Redeposition, reemission, surface diffusion, and complex simulations
• Efficient implementation of essentially nonoscillatory shock-capturing schemes. II
• Fronts propagating with curvature-dependent speed: Algorithms based on Hamilton-Jacobi formulations
• Level set method for two-phase incompressible flows under magnetic fields
• Octree-based, GPU implementation of a continuous cellular automaton for the simulation of complex, evolving surfaces
• Sparse field level set method for non-convex Hamiltonians in 3D plasma etching profile simulations
• Two Approximations of Solutions of Hamilton-Jacobi Equations
• Über die partiellen Differenzengleichungen der mathematischen Physik.

This page was built for publication: Implementation and evaluation of the level set method: towards efficient and accurate simulation of wet etching for microengineering applications

Report a bug (only for logged in users!)Click here to report a bug for this page (MaRDI item Q6556352)