Implementation and evaluation of the level set method: towards efficient and accurate simulation of wet etching for microengineering applications
From MaRDI portal
Publication:6556352
DOI10.1016/J.CPC.2013.05.016MaRDI QIDQ6556352FDOQ6556352
Authors: C. Montoliu, Néstor Ferrando, M. A. Gosálvez, J. Cerdá, R. J. Colom
Publication date: 17 June 2024
Published in: Computer Physics Communications (Search for Journal in Brave)
cellular automatalevel set methodMEMSparallel computingGPUsparse field methodanisotropic wet chemical etchingmicroengineering
Cites Work
- Fronts propagating with curvature-dependent speed: Algorithms based on Hamilton-Jacobi formulations
- Efficient implementation of essentially nonoscillatory shock-capturing schemes. II
- A fast level set method for propagating interfaces
- Two Approximations of Solutions of Hamilton-Jacobi Equations
- Level set method for two-phase incompressible flows under magnetic fields
- Octree-based, GPU implementation of a continuous cellular automaton for the simulation of complex, evolving surfaces
- A level set approach to a unified model for etching, deposition, and lithography. III: Redeposition, reemission, surface diffusion, and complex simulations
- A level set approach to a unified model for etching, deposition, and lithography. I: Algorithms and two-dimensional simulations
- A level set approach to a unified model for etching, deposition, and lithography. II: Three-dimensional simulations
- Sparse field level set method for non-convex Hamiltonians in 3D plasma etching profile simulations
- Über die partiellen Differenzengleichungen der mathematischen Physik.
This page was built for publication: Implementation and evaluation of the level set method: towards efficient and accurate simulation of wet etching for microengineering applications
Report a bug (only for logged in users!)Click here to report a bug for this page (MaRDI item Q6556352)