Nonlinear diffusion, boundary layers and nonsmoothness: analysis of challenges in drift-diffusion semiconductor simulations (Q2004436)
From MaRDI portal
!
This is the item page for this Wikibase entity, intended for internal use and editing purposes. Please use the normal view instead:
scientific article; zbMATH DE number 7256542
| Language | Label | Description | Also known as |
|---|---|---|---|
| default for all languages | No label defined |
||
| English | Nonlinear diffusion, boundary layers and nonsmoothness: analysis of challenges in drift-diffusion semiconductor simulations |
scientific article; zbMATH DE number 7256542 |
Statements
Nonlinear diffusion, boundary layers and nonsmoothness: analysis of challenges in drift-diffusion semiconductor simulations (English)
0 references
7 October 2020
0 references
finite volume method
0 references
finite element method
0 references
nonlinear diffusion and diffusion enhancement
0 references
Scharfetter-Gummel scheme
0 references
van Roosbroeck system for semiconductors
0 references
convergence order
0 references
0 references
0 references
0 references
0 references
0 references
0.9153271
0 references
0.90391326
0 references
0.8876518
0 references
0.8803824
0 references
